Solar Cell Single and Double Station Operation Glovebox with Purification and Laminar Flow System

Product Overview

This high-performance multi-workstation glovebox system integrates an independent double-station unit and a single-station unit interconnected through engineered large and small T-type transfer chambers. Designed for single-sided operation, the equipment provides an uninterrupted, hermetically sealed processing environment backed by a closed-loop gas purification column. By sustaining moisture and oxygen concentrations below 0.1 ppm under standard operating parameters, the system delivers an ultra-clean, inert nitrogen or argon atmosphere essential for sensitive synthesis and assembly workflows.

Engineered specifically for next-generation solar cell fabrication, perovskite research, organic photovoltaics (OPV), thin-film deposition, and lithium battery prototyping, the workstation supports complex multi-step processes without risking atmospheric contamination. The structural layout accommodates an integrated vacuum deposition or thermal evaporator interface directly on the recessed side of the chamber, enabling smooth substrate transfer between coating and assembly stages without exposure to ambient air.

Constructed from heavy-gauge 304 stainless steel with precision-machined flange viewports and automated PLC monitoring, this unit offers exceptional operational stability and ultra-low leak rates. The integration of high-efficiency particulate air filtration, dynamic chamber pressure regulation, and integrated closed-loop cooling ensures process consistency during demanding, continuous research and pilot-scale industrial manufacturing.

Key Features

• Dual-Chamber Interconnected Architecture: Features an 1800 mm double-station chamber and a 1220 mm single-station chamber joined via high-vacuum T-type transit chambers, enabling bi-directional substrate transfer and specialized zoning for coating, assembly, and testing.
• Ultra-Pure Gas Purification Unit: Single-column purification system loaded with 5 kg of copper catalyst and 5 kg of molecular sieve achieves high capacity removal (60 L O2, 2 kg H2O), reliably maintaining baseline impurities below 0.1 ppm.
• Integrated Evaporation System Interface: Left-side chamber features a specialized internal recess and dedicated vacuum interface to mount standard thermal or thin-film coating systems directly to the inert workspace.
• ISO 4 Downflow Laminar Filtration: Top-mounted cleanroom filtration unit utilizes H13 to U15 HEPA/ULPA filters and an adjustable blower (0.2 to 0.45 m/s face velocity) to provide US FED STD 209E Class 10 dust-free laminar conditions with continuous differential pressure monitoring.
• Independent Integrated Cooling System: Built-in 1050 W closed-loop refrigeration unit with a floor-standing split rotary compressor isolates mechanical vibration while regulating internal glovebox temperatures between 15°C and 36°C with 1°C precision.
• High-Precision Multi-Port Antechambers: Includes an automated large T-chamber with a three-door vertical lift mechanism, a manual small T-chamber, and an external mini antechamber for rapid material introduction without cross-contaminating connected modules.
• Intelligent Siemens PLC Automation: High-resolution touchscreen interface manages automated regeneration cycles, auto-purging routines, chamber pressure balancing (±15 mbar operating range, ±16 mbar auto-protection), and real-time data logging.
• Online Analytical Instrumentation: Equipped with an ultra-sensitive alumina ceramic thin-film moisture sensor and an electrochemical oxygen analyzer offering 0.1 ppm resolution and programmable limit alarms across a 0 to 1000 ppm range.
• Solvent Vapor Adsorption: Quick-change organic solvent vapor trap captures hazardous and volatile organic compounds (VOCs) generated during electrolyte handling or spin coating, safeguarding catalytic purification beds.
• Hermetic Build and Ergonomics: Constructed with 3 mm brushed 304 stainless steel, 8 mm tempered safety glass inclined viewing windows, one-piece machined sealing flanges, aluminum glove ports, and premium 32-inch butyl gloves for fatigue-free operation.

Applications

Technical Specifications

Why Choose This Product

• Engineered Workflow Continuity: The specialized combination of dual- and single-station chambers linked through multi-door T-antechambers enables distinct process isolation—separating chemical preparation, solvent handling, and sensitive thermal coating within a single unified footprint.
• Uncompromising Atmospheric Integrity: High-grade 3 mm stainless steel construction, precision O-ring flange-machined viewports, and automated valve manifolds deliver an ultra-low leak rate of ≤0.001 vol%/h, guaranteeing sub-0.1 ppm moisture and oxygen baselines even during continuous multi-user operations.
• Integrated Micro-Climate and Cleanliness: Unlike standard gloveboxes, this system integrates an ISO 4 laminar downflow system and a 1050 W vibration-isolated refrigeration unit, preventing both airborne particle defects and thermal convection fluctuations during sensitive substrate processing.
• Direct Thin-Film Coater Compatibility: The factory-machined left-side recess and standardized vacuum flanging eliminate the need for third-party modifications, allowing direct docking of thermal evaporators and magnetron sputtering units for seamless vacuum transfer.
• Intelligent Diagnostics and Traceability: Siemens-backed automated regeneration, gas-purging controls, real-time sensor data logging, and programmable limit alarms ensure full process repeatability and effortless compliance with academic and industrial quality standards.

Contact our technical engineering team today to request a detailed quotation, discuss custom chamber dimensions, or configure integrated deposition interfaces tailored to your research facility.

Trusted by Industry Leaders